Semiconductor Metrology Fundamentals
This foundational course, MET 101, provides an essential introduction to the world of semiconductor metrology, a critical discipline in modern microchip manufacturing. Students will gain a comprehensive understanding of why precise measurements are paramount in fabricating integrated circuits, exploring concepts such as thin-film stacks and critical dimensions (CD) from a metrology perspective. The curriculum differentiates between measurement and inspection, emphasizing the operational principles of both integrated and standalone optical metrology platforms, using industry-standard systems as a reference without vendor-specific endorsements. Key topics include the wafer manufacturing flow, strict cleanroom protocols, electrostatic discharge (ESD) prevention, and paramount tool safety procedures including lockout/tagout. This course equips future technicians with the fundamental knowledge and practical context necessary to thrive in a high-tech semiconductor fabrication environment.
Course outline
Lectures, virtual labs, and graded assignments — completed in your browser.
Syllabus
### Course: MET 101 - Semiconductor Metrology Fundamentals **Course Description:** This course provides a foundational understanding of semiconductor metrology principles and practices essential for technicians in modern wafer fabrication. Students will learn the critical role of measurement in semiconductor manufacturing, covering topics such as thin-film and critical dimension (CD) metrology, optical measurement techniques, wafer flow, cleanroom protocols, ESD prevention, and tool safety. The course emphasizes practical knowledge relevant to operating and maintaining optical metrology platforms. **Learning Outcomes:** Upon successful completion of this course, students will be able to: 1. Explain the fundamental importance of metrology in semiconductor manufacturing and differentiate between measurement and inspection processes. 2. Identify and describe key semiconductor structures, including thin-film stacks and critical dimensions, as they relate to metrology. 3. Describe the operational principles of integrated and standalone optical metrology platforms within a semiconductor fab context. 4. Apply knowledge of cleanroom protocols, wafer handling, and electrostatic discharge (ESD) prevention in a simulated or real semiconductor environment. 5. Recognize and follow critical safety procedures, including tool safety and lockout/tagout protocols, relevant to metrology equipment. **Grading Weights:** * Knowledge Checks: 15% * Assignments: 30% * Quizzes: 25% * Final Exam: 30% **Policies:** * **Attendance:** Regular attendance is expected. Students are responsible for all material covered in class, regardless of attendance. * **Academic Integrity:** All work submitted must be original. Plagiarism or cheating will result in a failing grade for the assignment and may lead to further disciplinary action. * **Late Submissions:** Assignments submitted late may incur a penalty unless prior arrangements have been made with the instructor due to extenuating circumstances. * **Cleanroom Conduct (Simulated/Theoretical):** While this course is largely theoretical, discussions will include adherence to strict cleanroom etiquette and safety. Any simulated exercises will require respectful and professional conduct.